Fault Isolation Techniques

Fault Isolation Techniques training covers both theoretical foundations and practical applications of advanced emission microscopy methods. Participants will explore techniques such as Photon Emission Microscopy, Thermal Emission Microscopy, and Optical Beam Induced Resistance Change (OBIRCH). The course includes hands-on operation of IR-OBIRCH, allowing attendees to gain direct experience with fault localization tools. Practical tips and insights from the resource speaker’s real-world experience will be shared to enhance understanding and application.

Course Objectives

☑ Understand the principles behind emission microscopy techniques
☑ Learn how Photon, Thermal, and OBIRCH methods are applied in fault isolation
☑ Operate IR-OBIRCH equipment in a hands-on lab setting
☑ Interpret results from emission-based fault localization
☑ Gain practical insights from industry-based case studies and expert experience

About the Speaker

Engr. Marlon Llana, M. Sce. Eng.

Engr. Marlon Llana has a B.S. and a Masters’ degree in Chemical Engineering from Mapua Institute of Technology and is a PhD Candidate for Material Science and Engineering. He has over 20 years of experience in the semiconductor industry in the field of Quality, R&D, Laboratory Operation, Electro-plating, Failure Analysis, and Reliability having worked for Philips Semiconductors, SunPower Mfg. Ltd., International Rectifier, and DECA Technologies. He is a former faculty at Malayan College Laguna, Lyceum of the Philippines Laguna, and Colegio de San Juan de Letran having taught for more than 14 years. He is also a technical assessor of DTI-PAB for ISO/IEC17025 and is a member of the DTI Technical committee for nanotechnology.

Course Objectives

About the Speaker

Engr. Marlon Llana, M. Sce. Eng.

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