Ion sputtering is a physical process used to remove or deposit material from a surface by bombarding it with high-energy ions, typically in a vacuum environment. It is widely used in thin film deposition, surface cleaning, and sample preparation for analytical techniques such as SEM, TEM, and SIMS.
In thin film applications, ion sputtering enables precise control over film thickness, composition, and uniformity. It is especially valuable for producing dense, pinhole-free coatings with excellent adhesion. The technique supports a wide range of materials, including metals, insulators, and semiconductors, and is compatible with multi-layer and alloy deposition.
