Fault Isolation Techniques
Fault Isolation Techniques training covers both theoretical foundations and practical applications of advanced emission microscopy methods. Participants will explore techniques such as Photon Emission Microscopy, Thermal Emission Microscopy, and Optical Beam Induced Resistance Change (OBIRCH). The course includes hands-on operation of IR-OBIRCH, allowing attendees to gain direct experience with fault localization tools. Practical tips and insights from the resource speaker’s […]
Failure Analysis Techniques for Semiconductor Devices
This course is a lecture-discussion on the failure analysis techniques in semiconductor devices. This will cover topics from electrical characterization of MOSFET (Igss, Idss, Bvdss etc), non-destructive, destructive analysis up to the application of Photon emission, Optical Beam Induced Resistance Change (OBIRCH), Thermal Emission to failure isolation. Practical tips based on actual experience of the […]
Infrared Optical Beam Induced Resistance Change (IR OBIRCH)
Infrared Optical Beam Induced Resistance Change (IR OBIRCH) (OB101) covers lectures on theories and application of emission microscopy techniques such as Photon Emission Microscopy, Thermal Emission Microscopy and Optical Beam Induced Resistance Change. This also involves hands-on operation of IR-OBIRCH. Practical tips based on actual experience of the resource speaker will be shared in the […]