Infrared Optical Beam Induced Resistance Change (IR OBIRCH) (OB101)

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About this Training

Infrared Optical Beam Induced Resistance Change (IR OBIRCH) (OB101) covers lectures on theories and application of emission microscopy techniques such as Photon Emission Microscopy, Thermal Emission Microscopy and Optical Beam Induced Resistance Change. This also involves hands-on operation of IR-OBIRCH. Practical tips based on actual experience of the resource speaker will be shared in the training.

About the Speaker

Engr. Marlon Llana, M. Sce. Eng.

Technical and Operations Director, NASAT Labs

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Eng’r. Llana has a B.S. and a Masters’ degree in Chemical Engineering from Mapua Institute of Technology. He is currently pursuing a doctorate degree in the same institution. He has over 20 years of experience in the semiconductor industry in the field of Quality, R&D, Laboratory Operation, Electro-plating, Failure Analysis and Reliability having worked for Philips Semiconductors, SunPower Mfg. Ltd., International Rectifier, and DECA Technologies. He is also a technical assessor of DTI-PAB for ISO/IEC17025 and is a member of DTI Technical committee for nanotechnology.

Training Schedule

This is a special training course. No upcoming training events are available for this course.
For interested participants, please send us an email at [email protected].
Customer-site trainings and private webinar trainings are available. (Contact us for more information.)

Customer-site trainings and private webinar trainings are available.
(Contact us for more information.)

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